Jaesung Engineering

습식 스핀 에처

Spin Etchers, LSE-200 (8 inch wafer)

LSE-300(12 inch wafer)

실리콘 웨이퍼의 스트레스완화, 폴리머 제거, 산화막식각(etching), 결합/금 범프(bump)같은 전후면 공정을 위해 비접촉 웨이퍼 홀더를 제공합니다.

		Specification

		Single wafer process, 6~12inch Manual loading and unloading system Acid-resistant materials and structure Chemical recycle Non contact wafer chuck Etch uniformity: + - 3% 2 chemicals, DIW rinse and N2 dry Temperature control for chemicals Chemical flow control Spray swing arm movement	LSE-200
		1500Wx1000Dx1900H mm (LSE-200)